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Vacuum deposition equipment Product List and Ranking from 19 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

Vacuum deposition equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

  1. サンユー電子 Tokyo//Testing, Analysis and Measurement
  2. テルモセラ・ジャパン 本社 Tokyo//Industrial Electrical Equipment
  3. ラボテック Tokyo//others
  4. 4 ヤシマ Osaka//Industrial Electrical Equipment
  5. 5 神港精機 東京支店 Tokyo//Industrial Machinery
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Vacuum deposition equipment Product ranking

Last Updated： Aggregation Period:Feb 11, 2026～Mar 10, 2026
This ranking is based on the number of page views on our site.

  1. Vacuum Deposition Device "LA-V5050" ラボテック
  2. Experimental small vacuum deposition device ヤシマ
  3. Sanyu Electronics Vacuum Application Equipment / Comprehensive Catalog of Electron Microscope Related Products サンユー電子
  4. 4 TMP type vacuum deposition device サンユー電子
  5. 5 Vacuum Deposition Device "MiniLab Series" テルモセラ・ジャパン 本社

Vacuum deposition equipment Product List

1～28 item / All 28 items

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Research and development vacuum deposition device

Research and development vacuum deposition device

Flexible response according to purpose and cost! For universities, public research institutions, and basic experiments.

The "Vacuum Deposition Device for Research and Development" is a series of compact deposition devices suitable for universities, public research institutions, and basic experiments. We offer two models: a front-door type equipped with an electronic evaporation source as standard and a simplified experimental type based on a fully manual resistance heating source. Both models (front-door type and simplified experimental type) can be flexibly customized according to purpose and cost. We have demo units available for sample testing. 【Features】 ■ Proven hardware with flexible cost options ■ A wide range of optional features tailored to specific needs (high-temperature heating, substrate cooling, multi-source simultaneous deposition, evaporation sources for organic materials, lift-off process support) ■ Support for ionization mechanisms such as plasma electrodes and RF coils, with options for additional plasma electrodes ■ Consistent customer support from sample testing to hardware customization and post-delivery follow-up *For more details, please refer to the PDF materials or feel free to contact us.

  • Evaporation Equipment
  • Vacuum deposition equipment

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Vacuum deposition equipment for wafer processes

Vacuum deposition equipment for wafer processes

Achieves a film formation mechanism with excellent film thickness uniformity and high-speed exhaust! Capable of stably forming high-quality electrode films.

The "Vacuum Deposition Device for Wafer Processes" is a batch-type deposition device designed for forming electrode films on wafers up to 6 inches in size. It has a wealth of experience in mass production applications for discrete ICs, compound ICs, and MEMS devices. The device can stably form high-quality electrode films due to its film formation mechanism, which excels in film thickness uniformity, and an oil-free exhaust system that enables rapid evacuation. It boasts a high operational rate as a deposition device for mass production applications. 【Features】 ■ Highly reliable basic configuration ■ Abundant optional mechanisms - Evaporation sources, multi-beam electron guns (10kW), resistance heating evaporation sources, multi-source simultaneous deposition mechanisms - High-temperature heating (up to 550°C) = three-sided planetary dome - Substrate cleaning, ion guns, RF bombardment mechanisms - Substrate dome, three-sided planetary dome, revolution dome, high-temperature heating revolution dome *For more details, please refer to the PDF materials or feel free to contact us.

  • Evaporation Equipment
  • Vacuum deposition equipment

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Experimental small vacuum deposition device

Experimental small vacuum deposition device

Equipped with MAX10V-150A power and a large-capacity LN2 trap, it enables rapid sample preparation. Its compact size makes it space-saving and reasonably priced.

Container dimensions: φ150×200H, exhaust system: 2-inch diffusion pump (with LN2) + rotary pump 20L/min. A 2-inch size is used for the main valve to effectively utilize the pump's exhaust capacity. The metal parts of the vacuum container, main valve, three-way valve, and leak valve are made of stainless steel.

  • Company：ヤシマ
  • Price：1 million yen-5 million yen
  • Other surface treatment equipment
  • Vacuum deposition equipment

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Electron beam vacuum deposition device

Electron beam vacuum deposition device

Metal coating and shadowing become ultra-fine particle deposition, improving resolution!

This device is developed as a deposition system suitable for all metals, particularly magnesium alloys, with the aim of advanced sample preparation in a clean high vacuum using an electron beam. The vacuum exhaust system combines a TMP of 80L/sec and an RP of 50L/min, utilizing fully automated exhaust systems with all electromagnetic valves. The achievable pressure reaches 10^-5 Pa without a liquid nitrogen trap. Additionally, we offer a "Magnetron Sputtering System" for coating tungsten thin films for electron microscopes, as well as a "3KV Ion Gun (SIG030)" used for thin film preparation and surface analysis experimental research. 【Features】 - The vacuum exhaust system combines a TMP of 80L/sec and an RP of 50L/min, utilizing a fully automated exhaust system with all electromagnetic valves. - The achievable pressure reaches 10^-5 Pa without a liquid nitrogen trap. - Metal coating and shadowing are performed through ultra-fine particle deposition, resulting in improved resolution. *For more details, please refer to the related links or feel free to contact us.*

  • Vacuum Equipment
  • Vacuum deposition equipment

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Sanyu Electronics Vacuum Application Equipment / Comprehensive Catalog of Electron Microscope Related Products

Sanyu Electronics Vacuum Application Equipment / Comprehensive Catalog of Electron Microscope Related Products

San-Yu Electronics, sputtering devices, vacuum deposition equipment, SEM/electron microscope-related equipment.

Since our establishment in 1976, we have consistently focused on "ease of use, simplicity, and convenience" in our manufacturing, allowing many people to utilize our sputtering devices (sputter coaters), vacuum deposition equipment, and SEM/electron microscope-related instruments. Our sputtering devices (sputter coaters) for SEM sample preparation, vacuum deposition equipment, and sputtering devices and vacuum deposition equipment for electrode attachment applications in various devices are well-received by researchers in university and public research institution laboratories, as well as by development personnel in private companies. We also handle electron microscope-related equipment such as tensile (fatigue) testing devices for SEM and electron beam lithography systems. For more details, please contact us or download our catalog.

  • Coater
  • Vacuum deposition equipment

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Glove box integrated vacuum deposition device

Glove box integrated vacuum deposition device

You can attach and detach the bell jar inside the glove box, and exchange or replenish the substrate and deposition materials!

We would like to introduce our "Glove Box Integrated Vacuum Deposition System." This compact deposition bell jar can deposit on 50×50 substrates and is housed within a glove box. You can attach and detach the bell jar inside the glove box to exchange or replenish substrates and deposition materials. 【Features】 ■ Capable of depositing on 50×50 substrates ■ Compact deposition bell jar housed within the glove box ■ Ability to attach and detach the bell jar inside the glove box to exchange or replenish substrates and deposition materials *For more details, please refer to the PDF document or feel free to contact us.

  • Evaporation Equipment
  • Vacuum deposition equipment

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Vacuum products - Vacuum deposition device

Vacuum products - Vacuum deposition device

The management innovation plan has been approved for the small roll coater.

For vacuum deposition equipment, please leave it to Fuji R&D Corporation. For more details, please contact us.

  • Other processing machines
  • Vacuum deposition equipment

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Compact! Simultaneous deposition! High expandability! 'Vacuum Deposition Equipment - HEX Series'

Compact! Simultaneous deposition! High expandability! 'Vacuum Deposition Equipment - HEX Series'

A versatile vacuum deposition device that allows for flexible configuration changes like assembling blocks | Sputtering, resistance heating deposition, electron beam deposition, organic deposition.

The HEX system features a unique "modular structure." By exchanging the panels that make up each face of the hexagonal prism-shaped chamber, you can freely change the number and arrangement of ports. As a result, you can easily modify the configuration and expand functionality, much like assembling blocks, in response to changes in research direction. The HEX system is a compact and highly expandable vacuum deposition device that fills the gap between benchtop systems and UHV systems, based on a new concept. ◆ The "modular structure" allows for flexible changes to the system configuration ◆ Supports sputtering, resistance heating deposition, electron beam deposition, and organic deposition ◆ Supports simultaneous film formation from multiple sources ◆ Compatible with sample rotation, heating, and water cooling ◆ Can be equipped with a film thickness monitor ◆ Compact design with a footprint of 60cm x 60cm ◆ Excellent expandability and maintainability ◆ Compatible with glove boxes (for lithium-ion batteries, etc.) For more details, please refer to the catalog available for download as a PDF. If you have any questions, please feel free to contact us.

  • Sputtering Equipment
  • Vacuum deposition equipment

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Vacuum Deposition Device "LA-V5050"

Vacuum Deposition Device "LA-V5050"

Vacuum deposition equipment that can be used as a pre-treatment device for TEM, SEM, and EPMA, as well as for the production of thin films and electrode films.

Labotech Inc.'s "LA-V5050" is a standard resistance heating vacuum deposition device. It is a desktop-type low-cost turbo vacuum deposition device designed with a focus on operability. It can quickly achieve a high vacuum state, making it suitable for pre-processing for TEM, SEM, and EPMA. Additionally, by selecting a cartridge holder, it can be used as a thin film device/electrode film production device. 【Features】 ■ Desktop type ■ Focus on operability ■ Speedy *For more details, please contact us or download the catalog.

  • Other physicochemical equipment
  • Vacuum deposition equipment

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[Equipment Introduction] Large Vacuum Deposition System

[Equipment Introduction] Large Vacuum Deposition System

We provide highly reliable products! We are equipped with advanced measuring and processing machines tailored to our expertise.

We would like to introduce the "Large Vacuum Deposition Equipment" owned by Okamoto Optics Co., Ltd. We possess two types of deposition: EB deposition and IAD deposition. Additionally, we are equipped with numerous facilities, including polishing machines, interferometers, and three-dimensional measuring devices. Our company is characterized by its ability to perform high-precision processing of large lenses and flat surfaces, and we can accommodate not only glass but also ceramics. Please feel free to contact us if you have any requests. 【Features】 - In-house equipped with advanced measuring and processing machines tailored to our know-how - Capable of providing highly reliable products - High-precision processing of large lenses and flat surfaces - Accommodates both glass and ceramics *For more details, please download the PDF or feel free to contact us.

  • Evaporation Equipment
  • Vacuum deposition equipment

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Small Vacuum Vapor Deposition Device "HVE-100" [Achieving Clean Film Formation!]

Small Vacuum Vapor Deposition Device "HVE-100" [Achieving Clean Film Formation!]

A compact vacuum deposition device capable of clean film formation! It is equipped with a shutter, allowing for stable deposition!

The "HVE-100" is a compact vacuum deposition device that saves space. The substrate deposition surface is installed facing downward, and the arrangement allows for deposition upwards through evaporation from a resistance heating source (deposition up). It is equipped with a shutter, enabling stable deposition. 【Features】 ■ High vacuum exhaust system: Achieves a vacuum level of <10^-4Pa for clean film formation ■ The chamber is made of SUS for easy maintenance and has internal anti-deposition plates ■ Space-saving/compact: Desktop model with dimensions of W500×D395mm ■ Compatible with your existing exhaust system and film thickness measurement devices *For more details, please refer to the PDF document or feel free to contact us.

  • Vacuum Equipment
  • Evaporation Equipment
  • Vacuum deposition equipment

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BAK Family Fully Automatic Vapor Deposition Function Equipped

BAK Family Fully Automatic Vapor Deposition Function Equipped

Introducing the BAK deposition platform that allows for various chamber sizes and process automation options.

The "BAK Family," a deposition machine equipped with a new level of flexibility and process control, not only provides deposition work for power devices, wireless, LEDs, MEMS, and photonics but also represents a new generation of deposition equipment that achieves automatic substrate exchange and high throughput. From the compact BAK501 for universities and research institutions to the Multi BAK for mass production, we can propose a suitable BAK for all customers, from research and development to mass production. 【Features】 ■Selectable deposition distances from 0.5m to 2.0m ■Highly flexible processes that allow the use of multiple materials without vacuum break ■Fully automated options incorporating load locks and loading robots *For more details, please refer to the related links or feel free to contact us.

  • Evaporation Equipment
  • Vacuum deposition equipment

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Organic EL Vacuum Deposition Device

Organic EL Vacuum Deposition Device

Organic EL Vacuum Deposition Device

The mask alignment mechanism achieves nano-order alignment using a fine motion piezo XY table and a coarse motion stepping motor XYΘ table.

  • Hydraulic Equipment
  • Vacuum deposition equipment

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Liftoff process compatible vacuum deposition equipment

Liftoff process compatible vacuum deposition equipment

This is a dedicated deposition device designed for the lift process commonly used in high-frequency communication devices.

The "Lift-off Process Compatible Vacuum Deposition System" is a dedicated deposition device designed for the lift-off process, widely used in optical devices and high-frequency communication devices such as compound semiconductors and SAW devices. Equipped with an electron gun and resistance heating electrodes as evaporation sources, it enables the formation of thick films, including high-melting-point electrode films and precious metals. It excels in the verticality of the incident angle of evaporated particles onto the substrate, and low-temperature deposition is possible due to various mechanisms that prevent temperature rise of the substrate during film formation (substrate water cooling mechanism, reflective electron trap for the electron gun, radiation light prevention measures). **Features** - Verticality of the incident angle of deposition particles onto the substrate (90°±3° at 6-inch wafers) - Low-temperature deposition (below 70°C = proven value) due to the substrate water cooling mechanism - High-speed exhaust with a large-diameter exhaust system and clean background for dense film quality - Flexible hard and soft compatibility with a rich variety of options (single wafer type = CtoC conversion, load lock conversion, composite process = load lock conversion + bonding with other process chambers) - A demo unit is permanently available for sample testing. *For more details, please refer to the PDF document or feel free to contact us.*

  • Evaporation Equipment
  • Vacuum deposition equipment

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TMP type vacuum deposition device

TMP type vacuum deposition device

Adoption of an easy-to-operate TMP exhaust system! A tabletop vacuum deposition device with excellent expandability.

The "SVC-700TMSG/7PS80" is a resistance heating vacuum deposition system of the TMP + RP type. It is a device focused on compactness and ease of use. It consists of the exhaust system "SVC-700TMSG" and the deposition power supply "SVC-7PS80." With its simple and easy operation, it also considers future functional expansions. A wide range of options expands the possibilities for thin film fabrication experiments. Additionally, dedicated options are available for experiments involving the fabrication of organic thin films. We also accept inquiries regarding installation within glove boxes (with many successful cases). 【Features】 ○ Compact size ○ Excellent expandability as a tabletop vacuum deposition system ○ Easy-to-operate TMP exhaust system adopted ○ Abundant options ○ Installation within glove boxes is also possible

  • Evaporation Equipment
  • Vacuum deposition equipment

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High-precision vacuum deposition device

High-precision vacuum deposition device

Productivity increased fourfold with a sample holder capable of 360-degree rotation and tilting.

It is a vacuum deposition device that forms various metal thin films on a substrate-like sample surface, with the film thickness being accurately controlled. It has very convenient features for investigating thickness dependence and evaporation rate dependence.

  • Other processing machines
  • Vacuum deposition equipment

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Vacuum deposition device for powder surfaces

Vacuum deposition device for powder surfaces

It is a vacuum deposition device for coating various metal thin films on the surfaces of granular or powdered samples.

By enabling evaporation from the source downwards, it has made it possible to deposit on non-fixable particulate samples.

  • Other processing machines
  • Vacuum deposition equipment

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Vacuum Deposition Device HSV Series

Vacuum Deposition Device HSV Series

Compact appearance and excellent internal mechanism.

A vacuum deposition device designed as the most versatile equipment for small-lot production, starting with experimental devices at universities and various research institutions.

  • Vacuum Equipment
  • Vacuum deposition equipment

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Business Introduction: Sales of Thin Film Manufacturing Equipment

Business Introduction: Sales of Thin Film Manufacturing Equipment

Thin film manufacturing equipment capable of producing from experimental and small-scale production machines to large-capacity processing machines.

The thin film manufacturing equipment developed from the user's perspective incorporates extensive experience as a job coater, is designed from the user's standpoint, and is assembled through discussions with customers in an "order system." We offer a variety of types, ranging from small experimental and small-scale production machines to large-capacity processing machines. All of our equipment is custom-made. Since we have a diverse range of evaporation sources, we will proceed with the design of the equipment while asking what, how much, and in what manner you would like to process. For more details, please contact us or refer to our catalog.

  • Company：ncc
  • Price：Other
  • Vacuum Equipment
  • Vacuum deposition equipment

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Multi-functional Vacuum Deposition Device "SEC-22C"

Multi-functional Vacuum Deposition Device "SEC-22C"

Liftoff, thick film, low-temperature film deposition compatible - the top model that combines Showa Vacuum's technology.

The multifunctional vacuum deposition device "SEC-22C" employs an electron beam evaporation source as its evaporation source. It can deposit high melting point metals and oxides. The control of evaporation rate and film thickness is conducted using a quartz oscillation type thickness gauge. The main pump is equipped with a cryopump. The operation control system is fully automated. 【Features】 ○ The evaporation source and substrate fixture are arranged to achieve a good film thickness distribution. ○ The electron beam evaporation source uses a 6-point crucible, allowing for the deposition of six different materials in the same vacuum. ○ The substrate can hold 30 pieces of φ75mm, 20 pieces of φ100mm, and 9 pieces of φ150mm. ○ Deposition is possible within an incident angle of ±5°. ○ The anti-deposition shield inside the vacuum chamber is divided for easy replacement. For more details, please contact us or download the catalog.

  • Evaporation Equipment
  • Vacuum deposition equipment

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Information on the sale of used vacuum equipment and devices.

Information on the sale of used vacuum equipment and devices.

All models are overhauled and delivered in a fully operational state.

At Green Tech Co., Ltd., we conduct complete overhauls and sell, maintain, and rent used vacuum equipment and devices that have been performance-verified. Our product lineup includes sputtering devices and vacuum deposition equipment, as well as measuring instruments like He leak detectors, and individual items such as power supplies, electron guns, vacuum gauges, and pumps. Please feel free to contact us if you have any requests. [Features] ■ Abundant stock of sales items ■ Complete overhauls conducted *For more details, please contact us.

  • Vacuum Equipment
  • Vacuum pump
  • valve
  • Vacuum deposition equipment

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Comprehensive Catalog - Vacuum Deposition Equipment

Comprehensive Catalog - Vacuum Deposition Equipment

A complete flow that you can trust to handle everything from model selection to consumable supply and after-sales support.

This catalog is a comprehensive catalog from Craft Co., Ltd., a specialized manufacturer of vacuum deposition equipment. (*Prostaff Co., Ltd. acts as a sales manufacturer for Craft Co., Ltd., while Prostaff plays a role in the manufacturing sector.) It includes a wide range of products, starting with the automatic vacuum deposition equipment [custom-made] CAP series, as well as maintenance menus and introductions to processed products. [Contents] ■ Automatic vacuum deposition equipment [custom-made] ■ Refurbished items [used items] ■ Equipment maintenance ■ Parts maintenance ■ Deposition materials and processed products, etc. *For more details, please download the PDF or feel free to contact us.

  • Vacuum Equipment
  • Vacuum deposition equipment

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Vacuum Deposition Device "MiniLab-080"

Vacuum Deposition Device "MiniLab-080"

Flexible configuration available upon request for methods such as deposition, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during deposition.

The ML-080, with a volume of 80 liters and dimensions of 400(W)x400(D)x570(H)mm, is composed of a D-type box chamber. It has the same configuration as the 060 model but features a taller chamber, which extends the TS distance adjustment range and improves film uniformity during deposition on large-diameter substrates, making it an optimal model for vacuum deposition. It is a higher-end model than the ML-060, which can also accommodate a load lock mechanism. Like the 060, it is compact yet supports a wide range of applications including resistance heating deposition (for metals, insulators, and organic materials), EB deposition, RF/DC/PulseDC compatible magnetron sputtering, RIE plasma etching, CVD, and annealing. - Maximum substrate size: Φ10 inches - Resistance heating deposition sources x up to 4 sources - Organic deposition sources x up to 4 sources - Magnetron sputtering cathodes x 4 sources - Electron beam deposition - Substrate heating stage (standard 500°C, max 1000°C) - *Plasma etching / <30W soft etching - CVD (thermal CVD, PECVD) *Plasma etching can be installed in both the main chamber and the load lock chamber.

  • Evaporation Equipment
  • Sputtering Equipment
  • Etching Equipment
  • Vacuum deposition equipment

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Vacuum deposition device 'MiniLab-090' (for glove box)

Vacuum deposition device 'MiniLab-090' (for glove box)

Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.

MiniLab-080 glove box model with an 80ℓ large capacity chamber designed to be stored within a glove box bench. It features a slide-open and close chamber that maximizes the use of the workbench, and a rear-opening door designed with maintenance in mind. Samples processed can be consistently handled within a controlled environment inside the glove box without exposure to the atmosphere or moisture. For specifications of the GB gas purification unit, please refer to the GB model. ◉ Resistance heating evaporation source x up to 4 ◉ Organic evaporation source x up to 4 ◉ Magnetron sputtering cathode x 4 ◉ Electron beam evaporation ◉ Dry etching ◉ Annealing

  • Evaporation Equipment
  • Sputtering Equipment
  • Annealing furnace
  • Vacuum deposition equipment

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Vacuum Deposition Device "MiniLab Series"

Vacuum Deposition Device "MiniLab Series"

Due to its modular embedded design, it is possible to flexibly assemble dedicated machines according to the required film formation methods. A compact thin-film experimental device that can accommodate various research applications.

**Flexible System** The MiniLab thin film experimental device series allows for easy construction of a compact system without waste, even as a customized product, by incorporating components (such as deposition sources and stages) and control modules tailored to the required deposition methods and materials from a wide range of options. By configuring the system with a modular control unit in a Plug&Play manner, the application range expands, enabling various thin film process experiments. The MiniLab series is a high cost-performance system that caters to a wide range of applications from research and development to small-scale production. **Small Footprint & Space-Saving** - Single Rack Type (MiniLab-026): 590(W) x 590(D)mm - Dual Rack Type (MiniLab-060): 1200(W) x 590(D)mm - Triple Rack Type (MiniLab-125): 1770(W) x 755(D)mm **Excellent Operability & Intuitive Operation Screen** Windows PC or 7” touch panel. Easy operation that does not require expertise, with maximum safety considerations.

  • Sputtering Equipment
  • Evaporation Equipment
  • Annealing furnace
  • Vacuum deposition equipment

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Vacuum Deposition Device "nanoPVD-T15A"

Vacuum Deposition Device "nanoPVD-T15A"

We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.

High-performance organic source LTE (up to 4 sources) with excellent temperature responsiveness/stability for organic materials such as OLED, OPV, and OTFT, and a metal deposition source TE (up to 2 sources) that allows for easy exchange and maintenance. It can operate in manual mode, as well as in automatic modes for continuous multilayer film deposition and simultaneous film deposition. Despite its compact size, it achieves performance similar to that of standalone large machines without sacrificing basic performance, film quality, uniformity, or operability. Additionally, it features fully automated control via a simple touch panel with PLC. The user-friendly HMI allows anyone to operate it intuitively without requiring complicated operating procedures. It comes with remote software "IntelliLink," which connects to a Windows PC via USB cable, enabling monitoring of the device's operating status, log saving, online/offline recipe creation and saving, and fault analysis. This compact vacuum deposition system is designed to maximize the effective use of limited development and lab space while also excelling in maintenance.

  • Evaporation Equipment
  • Vacuum deposition equipment

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Vacuum Deposition Device "MiniLab-026"

Vacuum Deposition Device "MiniLab-026"

Compact and space-saving! Ideal for research and development, flexible configuration for purposes such as deposition, sputtering, and annealing.

This is a flexible thin film experimental device for R&D that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 4, organic materials x4), and can be equipped with a substrate heating stage, allowing for the production of annealing devices and plasma etching. There is also a glove box storage type available (specifications to be discussed). A wide range of optional components that can be flexibly customized is available. ◉ Maximum substrate size: Φ6 inch ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 sources) ◉ Organic evaporation source: 1cc or 5cc ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Dry etching ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous deposition from 2 sources, HiPIMS, automatic thin film controller, custom substrate holders, substrate rotation/lifting, substrate heating, and many more options available. * Please first contact us with your required specifications, and we will configure the system according to your needs.

  • Evaporation Equipment
  • Sputtering Equipment
  • Annealing furnace
  • Vacuum deposition equipment

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Vacuum deposition device for forming LED optical multilayer DBR films - Sapio-DBR

Vacuum deposition device for forming LED optical multilayer DBR films - Sapio-DBR

Optimal for the deposition of optical multilayer DBR films for LEDs!

Sapio-DBR (SGC-S1550i/S1300i series) is a vacuum deposition device specialized for optical multilayer DBR films for LEDs, offering good uniformity within the dome and enabling improved production efficiency. It is optimal for the deposition of optical multilayer DBR films for LEDs. 【Features】 ○ Excellent mass production performance → Substrate capacity: Approximately 400 pieces of φ2 inch wafers/batch Approximately 110 pieces of φ4 inch wafers/batch → Cycle time: Within 3 hours/batch → Required installation area: W4.6m × D6.3m × H3.2m * When using SGC-S1550i * Removal of the ceiling panel on the factory side may be necessary when attaching or detaching the quartz film thickness gauge. ○ Excellent reproducibility, continuous batch guarantee also available ○ Film quality adjustment is possible; we can assist with condition correction to suppress film damage due to chipping. For more details, please contact us or download the catalog.

  • Evaporation Equipment
  • Vacuum deposition equipment

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